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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
115857
4-inch HFCVD System for CVD Diamond and Related Materials 
4-inch HFCVD System for CVD Diamond and Related Materials 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Sterling, MA
4-inch HFCVD System for CVD Diamond and Related Materials:
  • Hot Filament CVD system engineered for diamond deposition on a 4 inch (~100mm) rotary platen.
  • System design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

This equipment was previously used for commercial R&D of polycrystalline CVD Diamond materials.

Design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species.

Cline Innovations intends to refurbish and reintegrate this system with updated controls and interlocks, likely including PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible.  Run-off testing is possible prior to shipment.

197026
Applied Materials  

Applied Materials  

Centura EPI 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   East Fishkill, New York
AMAT, Centura EPI, 300mm, Epi Deposition System:
AMAT, Centura EPI, 300mm, Epi Deposition System

Two - Epi Deposition Chambers.
One - SiCoNi Chamber,

In the Fab, Cold.

S/N 411383
56326
Applied Materials  

Applied Materials  

P5000 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT P5000 MARK II SYSTEM:
AMAT P5000 Mark II Hybrid System.
Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel.
Integrated endpoint system with 2 monochromators.
Currently configured for 100mm wafers.


System is fully configurable to your specifications..
23215
Applied Materials  

Applied Materials  

P5000 MARK II 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT TEOS DEPOSITION, OXID ETCH, P5000:
Mark II System
TEOS Deposition, Oxide Etch
199734
Applied Materials  

Applied Materials  

Centura DCVD 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Singapore
Applied Materials, Centura DCVD, 200mm, DARC, 3 Chambers:
Applied Materials, Centura DCVD, 200mm, DARC, 3 Chambers

Bagged  & Skidded in warehouse

S/N: CA85
199721
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Singapore
Applied Materials, P5000, Passivation 200mm:
Applied Materials, P5000, Passivation 200mm

Still in the FAB.
199651
Applied Materials  

Applied Materials  

Producer III 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore
Applied Materials, Producer CVD, 200mm:
Applied Materials, Producer CVD, 200mm
Producer III

On Line in the Fab.

S/N: 306133


183418
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2561

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2561

183417
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2560

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2560

183169
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, NY
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2541

2011 Vintage
183170
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2540

2011 Vintage

 

Tool ID: FVX2541

 
196930
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation

Cold shutdown

Vintage 1997

S/N: 71F5669AE
196931
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation



S/N: 71F5669AC







196932
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation


Cold, Shutdown

S/N: 71F5669AE


199194
ASM  

ASM  

E3200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:

ASM, E3200, 300mm, Epi Deposition System

Left Handed Reduced Pressure

FRONT END INTERFACE
Load Ports (Qty. 2) ISOPORT
FOUP ID Reader (RF), Qty. 2
Side Louvered Panels/Flat Top (Ballroom Configuration)
Light Tower - 4 position (STD)
Installation (2 per system):
Door Mounted on Wafer Transfer Module (Std)
FEI Mount (for Ballroom configuration)
Dual 25 wafer Loadlock

Vacuum Load Locks
Level 2
(VLL configured for two pumps: one dedicated
to LL#1 and LL #2 and one for WHC)
REACTOR MODULE
HCI Detector- Reactor
TEK

Gases (Unit/Clerity 8161 digital0
N2
H2 - 100slm
HCl - 30slm
B2H6 - 20/200/200
As3/Ph3 - 20/200/200
DCS - 500sccm
SiH4 - 500sccm
GeH4 - 200sccm

Bottom Services





199195
ASM  

ASM  

E3200  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:

ASM, E3200, 300mm, Epi Deposition System

Warm Idle
S/N: 034040

Right Handed System


195174
ASM  

ASM  

E3200  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:
ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System
Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

195647
ASM  

ASM  

Epsilon 3200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System

Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

184607
Astex  

Astex  

AX5000, AX6000, AX6350 or similar 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Astex AX5000 Microwave Plasma Diamond Growth System:
  • Multiple stainless steel, Astex microwave plasma CVD chambers and plasma couplers currently available as the basis for refurbishment and reintegration.
  • Systems can be reintegrated based on customer's application needs using a combination of reliable, new and used/refurbished components.
  • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
  • 1.5kW to 5kW microwave power input.
  • 3 stage options: Cooled, Heated, or Thermally Floating.
  • Computer controls.
189843
Astex  

Astex  

AX6500 "Clamshell" MPCVD 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, Massachusetts
Astex AX6500 Diamond Growth System:
  • **ON HOLD**  This system is on a temporary inventory hold pending possible purchase.
  • Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
  • Capable of high rate single-crystal (SCD) diamond homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD), ultrananocrystalline diamond (UNCD).
  • System to be refurbished & updated with modernized computer controls, higher throughput water cooling subsystem, and enhanced process control/monitoring devices.
  • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
  • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
137483
Astex  

Astex  

ECR-MOCVD-PECVD 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, Massachusetts
ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD):
High density plasma system activated by ECR-enhanced, 2.45GHz microwave input offers PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, diamond & related carbon materials, and nanomaterials at relatively low substrate temperatures.

Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching.

This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.

137544
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Celsior mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Celsior mainframe:
Aviza Celsior mainframe



Aviza Celsior mainframe
Equipment Code: CVD304-04

LOCATION: Dresden
137540
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Pantheon Mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Pantheon Mainframe:
Aviza Pantheon Mainframe
Equipment Code: CVD304-03


Aviza Pantheon Mainframe with 3 chambers
Serial Number: OX0412-005
98056
Carbone  

Carbone  

G-III 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

5   F* Scotia, NY
CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR:
Silicon Carbide 200 mm Disc Susceptor

Carbone of America Part number 017893-001
187926
Cline Innovations  

Cline Innovations  

Custom CVD Diamond System 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Custom CVD Diamond Systems:

Cline Innovations is now designing and building custom microwave plasma CVD systems for technically discerning customers.  Please contact us to discuss your advanced CVD diamond process specifications.

197965
ASM  

ASM  

Epsilon 3200 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

1   F* Villach, Carinthia
EPI ASM:
ASM EPI Epsilon 3200
137566
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (NITRID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Furnace TEL Minibatch (NITRID):
OfenTel Minibatch (NITRID)
Equipment Code: OFE361-01

TEL Formula Minibatch furnace for Nitride, 4


OfenTel Minibatch (NITRID)
Serial Number: P00000315001
137567
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (OXID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
FurnaceTel Minibatch (OXID):
OfenTel Minibatch (OXID)
Equipment Code: OFE361-02

TEL Formula Minibatch furnace for Oxide


OfenTel Minibatch (OXID)
Serial Number: P00000315002
190993
Kokusai  

Kokusai  

Quixace Ultimate 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF:

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Low Temp Steam Anneal - for SOD Cure

S/N: T2DD6-18711

190748
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N T2DC6-16590

ALD TiN

Tool is New In Box, with New Quartz.  Never installed.
190749
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N: T2DC6-16595

ALD TiN
180506
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Dresden, Saxony
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF:
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
TiCl4, NH3 - Process for TiN - Prior Use

Cartridge Heater - D4EX22250, RHC2 Heater
Number of control zone, 5 zones
Heater element material - KANTHAL APM
Maximum heating temperature range - 1050 degC (in Furnace)
Flat zone length - 800mm (±2.0 degC at 800 degC)
Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
Main Operation Unit - TM150-HKT05 
Sub Operation Unit - D4EX40577
Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
Bottle (For Ti Source) - BK1200URK, Made by Schumacher
N2 Purge Load Lock System
O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

PUMPS INCLUDED.  See Photo attached.

S/N: T2DC6-15901
194725
Kokusai  

Kokusai  

DD-1206V-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
Kokusai Quixace, 300mm, DD-1206V-DF:
Kokusai Quixace, 300mm, DD-1206V-DF

LP SiN 

S/N : T2DC6-13303

!!! MULTIPLE UNITS AVAILABLE !!!  Please inquire
190750
Kokusai  

Kokusai  

DD-1223VN 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN:
Kokusai Quixace, 300mm, DD-1223VN

ALD-TiN 

S/N T2DC6-16441
195356
Kokusai  

Kokusai  

DJ-1206VN-DM 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN:
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN

S/N : T1DC6-13301

Tool is Crated in warehouse in Singapore.

!!!Multiple Units Available!!!  Please inquire
199768
Kokusai  

Kokusai  

Quixace-II 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
Kokusai Quixace, 300mm, Quixace-II:
Kokusai Quixace, 300mm, Quixace-II

Doped Poly




S/N: P2DC7-14115-1
199736
Kokusai  

Kokusai  

DJ-835V (L/L) 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore
KOKUSAI, 200mm, DJ-835V (L/L), Doped Poly Vertical Furnace:
KOKUSAI, 200mm, DJ-835V (L/L), Doped Poly Vertical Furnace

Major Parts Missing

In the fab.

S/N: DC2-10813-1
199737
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore
KOKUSAI, 200mm, DJ-853V, HTO, DCS, Vertical Furnace:

KOKUSAI, 200mm, DJ-835V, HTO, DCS,  Vertical Furnace

Major parts Missing

In the Fab.

S/N: DC3-10955-2

199738
Kokusai  

Kokusai  

DJ-935V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore
KOKUSAI, 200mm, DJ-853V, LPCVD DCS SiN, Vertical Furnace:
KOKUSAI, 200mm, DJ-853V, LPCVD DCS SiN, Vertical Furnace

Major Parts Missing

In the fab.

S/N: DC3-00221-1
199741
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore
KOKUSAI, 200mm, DJ-853V, LPCVD SiN, DCS, Vertical Furnace:
KOKUSAI, 200mm, DJ-853V, LPCVD SiN, DCS,  Vertical Furnace

Major Parts Missing.

In the fab.

S/N: DC2-10820-1
100429
Materials Technology  

Materials Technology  

02-01808 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

4   F* Scotia, NY
MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR:
EPI 3 1/4" Barrel Susceptor

MTC EPI Reactor Parts
For 3 Inch Wafers
11074
Nexx Systems  

Nexx Systems  

Cirrus 300 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
NEXX SYSTEMS ECR PECVD RIE SYSTEM:
Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex

This system is designed for the fluorination of DLC surfaces on various substrates.
The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy.
High magnetic field launch produces a highly stable and efficient ECR plasma.

Nexx Systems Cirrus 300

198242
Novellus Systems  

Novellus Systems  

C3 SPEED MAX 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Malta, New York
Novellus, SPEED MAX, 300mm, HDP CVD:
Novellus, SPEED MAX, 300mm, HDP CVD
2 Chambers
199769
Novellus Systems  

Novellus Systems  

Vector Express 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Dresden, Saxony
Novellus, Vector Express, AHMxT, 300mm, CVD :
Novellus, Vector Express, AHMxT, 300mm, CVD 

Alpha Carbon Dep.

S/N: 
D21337A
181540
Oxford Instruments  

Oxford Instruments  

Plasmalab System 100 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
OXFORD INSTRUMENTS PLASMALAB 100 PECVD:
PECVD TEOS Tool with Load Lock
191492
Picosun  

Picosun  

Sunale R-200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* East Fishkill, New York
Picosun, Sunale R-200, Advanced ALD Reactor, 200mm:
Picosun, Sunale R-200, Advanced ALD Reactor, 200mm

Configured with three canisters and chemicals to deposit Ni, HfO, Ru and SiO, Al

SUNALETM R-200 Advanced ALD System
The ALD reactor has six separate inlets for precursor sources. It can accommodate up to twelve precursor sources. Maximum deposition temperature of the ALD reactor is 500 °C.

 Vacuum chamber (AISI304)

AISI 304 stainless steel vessel with KF/CF connection flanges for RC-200 reaction chamber.

Reaction Chamber (AISI316L)
RC-200 Chamber and lid with metal sealing surface. Customer specified chamber size up to 8”single Si wafer or smaller wafers (4”, 6”) and pieces

Sample holder SH-200
Substrate holder for one up to 8” wafer or smaller wafers (4”, 6”) and pieces compatible with reaction chamber

Advanced source control and electronics system
Touch panel PC and electronics cabinet used for operating the ALD reactor with Advanced 12-source ALD software and electronics

PicosolutionTM 600 source system

Cooled source systems for high vapor pressure liquid precursors (e.g. for TMA, TiCl4 and H2O). Maximum capacity 600mL. 3ea.

Boosted PicohotTM 200 source system

Heated source systems (up to 200 °C) for low vapor pressure metal precursors (e.g. for TEMAHf, TEMAZr). Suitable also for high vapor pressure chemicals.  2ea.

PicohotTM 300 source system

Heated source system (up to 300 °C) for low vapor pressure metal precursors (e.g. for HfCl4, ZrCl4).  1ea.

PicogasesTM Connection

Allows for the connection of an additional externally supplied compressed gas for use as an ALD precursor (e.g. NH3, O2). Includes plumbing, valves, and control of extra gas source.

DOM:6/18/2013

147470
Plasma-Therm  

Plasma-Therm  

790 PECVD 11" 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM PECVD 790:
Refurbished PECVD System with 11" Electrode
30246
Plasma-Therm  

Plasma-Therm  

VLR 700 VLR-PM1-ICRB-PM 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM VLR 700:
Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.
196775
Seki Diamond Systems  

Seki Diamond Systems  

Model SDS6U "Clamshell" 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, Massachusetts
Seki Diamond Systems SDS6U 6kW Clamshell system:
  • Cline Innovations is the exclusive broker for a Seki Diamond Systems Model SDS6U MPCVD clam shell system.
  • Built by Carat Systems for SDS (Cornes) prior to the dissolution of their clamshell system sales relationship. 
  • Bottom-launched electromagnetric design was originally developed by Astex.
  • Available for immediate sale to qualified buyers with potential to expedite delivery to international locations.
  • Very good to excellent condtion and is still installed and operational in USA.
  • Past use of system was for single-crystal CVD diamond (SCD) growth.
  • System type capable of producing single-crystal, polycrystalline, and nanocrystalline diamond films or bulk, freestanding deposits.
191258
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, AP, Forming Gas Anneal 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
SVG, AVP 8000 AP, 200mm Vertical Furnace:

SVG, AVP 8000 AP, 200mm Vertical Furnace

S/N: 4272

Cu Anneal (Single Boat)

191268
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, Gate Ox 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation:
SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation

Thermal Gate Oxideation furnace

S/N: 4252
191275
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 LP Poly 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
SVG, AVP 8000 LP, 200mm Vertical Furnace, LPCVD Poly:
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Poly (Plain Poly)

S/N: 4257
191277
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 LP TEOS 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Singapore
SVG, AVP 8000 LP, 200mm Vertical Furnace, LPCVD TEOS:
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD TEOS

S/N: 4425
191274
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, AP, Oxidation 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
SVG, AVP 8000 LP, 200mm Vertical Furnace, Oxidation:
SVG, AVP 8000 LP, 200mm Vertical Furnace, Oxidation

S/N: 4409


199735
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore
TEL Alpha 8 S, 200mm, Vertical Furnace, Forming Gas Anneal:
TEL Alpha 8 S, 200mm, Vertical Furnace, Forming Gas Anneal

Major parts missing.

Wafer transfer F/B motor1/pc
Wafer transfer F/B timing belt1/pc
Wafer transfer forks 1/Set
CONTACTOR,MAGNETIC..SD-N80 DC24V1/pc
TRANSFORMER..CB-L-1 P200V S24V 1/pc
Spike TC 2/pc


In the fab.

S/N: A00009770123
187657
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride:
TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride

S/N: A00000015042

Bagged and Skidded in Warehouse
178712
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy + 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
TEL Indy +, Vertical Furnace, 300mm:
TEL Indy +, Vertical Furnace, 300mm

LP ALD
194724
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy Plus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
TEL Indy +, Vertical Furnace, 300mm:
TEL Indy +, Vertical Furnace, 300mm


190746
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2:
TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2
190747
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2:

TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2

178714
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy + 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Taichung, Taichung City
TEL Indy, Vertical Furnace, 300mm:
PSZ (Poly-Silazane) Cure Furnace, 300mm
Heater: FTP VOS-56-101P 4zone / RT-1100 (C) / with RCU
Process Condition: AP+Sub-AP
MAX Operating Temp: 900degC

137543
TEL Corp.  

TEL Corp.  

TEL Trias TI/TiN-ALD for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
TEL Trias TI/TiN-ALD :
TEL Trias TI/TiN-ALD
Equipment Code: CVD314-01


TEL Trias TI/TiN-ALD
Serial Number: C10503
137546
Tokyo Electron Ltd  

Tokyo Electron Ltd  

TEL Trias TI/TiN-ALD for 12" / 300 mm 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Regensburg, BY
TEL Trias TI/TiN-ALD :
TEL Trias TI/TiN-ALD
Equipment Code: CVD314-02


TEL Trias TI/TiN-ALD
Serial Number: C13503
199092
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Trias CVD 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Taichung, Taichung City
TEL Trias, CVD Ti TiN, 300mm:

TEL Trias, CVD Ti TiN, 300mm

199090
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Trias CVD 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Taichung, Taichung City
TEL Trias, CVD TiN, 300mm:
TEL Trias, CVD TiN, 300mm
199201
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
TEL, Alpha 303i, 300mm Vertical Furnace, Low Temp:

TEL, Alpha 303i, 300mm Vertical Furnace, Low Temp

Bagged & Skidded in Warehouse

195346
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
TEL, Alpha 303i, 300mm Vertical Furnace, LT SOD cure:
TEL, Alpha 303i, 300mm Vertical Furnace, LT SOD cure
195348
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
TEL, Alpha 303i, 300mm Vertical Furnace, P-Doped Poly:
TEL, Alpha 303i, 300mm Vertical Furnace, P-Doped Poly

S/N : L00000735083


199202
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
TEL, Alpha 303i, 300mm Vertical Furnace, SiN:
TEL, Alpha 303i, 300mm Vertical Furnace, SiN

Bagged & Skidded in Warehouse

!!! Multiple Units Availalbe !!!
199739
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S ZA 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore
TEL, Alpha 8S ZA, 200mm, Vertical Furnace, HLD:
TEL, Alpha 8S ZA, 200mm, Vertical Furnace, HLD

Major Parts Missing

S/N: A00009855308
199740
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S ZA 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore
TEL, Alpha 8S ZA, 200mm, Vertical Furnace, HLD:
TEL, Alpha 8S ZA, 200mm, Vertical Furnace, HLD

Major Parts Missing.

In the fab.


178252
Tel  

Tel  

Trias 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Taichung, Taichung City
TEL, CVD, 300mm:
Manufactured in 2010; Status: Crated


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire
178249
Tel  

Tel  

Trias 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Taichung, Taichung City
TEL, Trias CVD, 300mm:
Manufactured in 2005; Status: Bagged and Skidded


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment:
AG Associates, Applied Materials, Inc., ASM, Astex, Aviza Technology Ltd., Carbone, Cline Innovations, Kokusai, Materials Technology, Nexx Systems, Novellus Systems, Oxford Instruments, Picosun, Plasma-Therm, Seki Diamond Systems, Silicon Valley Group, Tel, TEL Corp., Tokyo Electronics Limited