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Chemical Vapor Deposition Equipment


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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
115857
4-inch HFCVD System for CVD Diamond and Related Materials 
4-inch HFCVD System for CVD Diamond and Related Materials 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

4-inch HFCVD System for CVD Diamond and Related Materials:
  • Hot Filament CVD system engineered for diamond deposition on a 4 inch (~100mm) rotary platen.
  • System design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

This equipment was previously used for commercial R&D of polycrystalline CVD Diamond materials.

Design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species.

Cline Innovations intends to refurbish and reintegrate this system with updated controls and interlocks, likely including PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible.  Run-off testing is possible prior to shipment.

1   F* Sterling, MA
203108
Applied Materials  

Applied Materials  

Producer GT Chamber 

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in Chemical Vapor Deposition Equipment

AMAT, Producer GT Chamber, TOPAZ, 300mm, CVD,:

AMAT, Producer GT Chamber, TOPAZ, 300mm, CVD,

Topaz chamber

Warm idle, In Fab.

1   East Fishkill, New York
56326
Applied Materials  

Applied Materials  

P5000 

List all items of this typeCluster PECVD Tools

in Production Tools

APPLIED MATERIALS AMAT P5000 MARK II SYSTEM:
AMAT P5000 Mark II Hybrid System.
Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel.
Integrated endpoint system with 2 monochromators.
Currently configured for 100mm wafers.


System is fully configurable to your specifications..
1   F* Scotia, NY
23215
Applied Materials  

Applied Materials  

P5000 MARK II 

List all items of this typeCluster PECVD Tools

in Production Tools

APPLIED MATERIALS AMAT TEOS DEPOSITION, OXID ETCH, P5000:
Mark II System
TEOS Deposition, Oxide Etch
1   F* Scotia, New York
204515
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Centura, UltimaX, HDPCVD, 300mm:

Applied Materials, Centura, UltimaX, HDPCVD, 300mm

 

Bagged & Skidded in warehouse.

S/N : 412577

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1   Singapore
178246
AMAT  

AMAT  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, HDP CVD, 300mm Oxide Deposition:

Manufactured in 2007; Status: Bagged and Skidded 3 Chamber system

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1   Taichung, Taichung City
205377
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, HDP CVD, UltimaX, 300mm Oxide Deposition:

Applied Materials, HDP CVD, UltimaX, 300mm Oxide Deposition

 

Bagged & Skidded in Warehouse

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1   Singapore
204490
Applied Materials  

Applied Materials  

Olympia ALS 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Olympia, SiN, LowK, ALD, 300mm:

Applied Materials, Olympia, SiN, LowK, ALD, 300mm

Single Chamber

In the fab. Warm idle

S/N: 430766

2015 Vintage

1   Malta, New York
204925
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, P5000 CVD, 3 chamber, 200mm:

Applied Materials, P5000 CVD, 3 chamber, 200mm

S/N : A055

Bagged & Skidded in Storage

2 SABPSG, 1 Nitride

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1   Burlington, Vermont
204926
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, P5000 CVD, 3 chamber, 200mm:

Applied Materials, P5000 CVD, 3 chamber, 200mm

3 Chamber Tool (2 SABPSG, 1 Nitride)

S/N : 4798

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1   Burlington, Vermont
201552
Applied Materials  

Applied Materials  

Producer SE 

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in Chemical Vapor Deposition Equipment

Applied Materials, Producer SE, AMAT, 300mm, ULK:

Applied Materials, Producer SE, AMAT, 300mm, ULK
3 Chamber ULK

In Fab - Idle

S/N : 422953



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1   Malta, New York
200778
Applied Materials  

Applied Materials  

Producer (Shrink) 

List all items of this typeChemical Vapor Deposition Equipment - Other

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Applied Materials, Producer, Shrink, 200mm:

Applied Materials, Producer, Shrink, 200mm

3x Twin Chambers

Hydride based Ox Nit

DOM : 2004

S/N : 332530


1   Singapore
202855
Applied Materials  

Applied Materials  

Producer (Shrink) 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Producer, Shrink, 200mm:

Applied Materials, Producer, Shrink, 200mm

Bagged & Skidded in warehouse

S/N reported is 401403.  Must be confirmed at inspection.

Photos must be taken at Inspection.

No details recorded.

1   Singapore
204493
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Ultima X CVD, 300mm:

Applied Materials, Ultima X CVD, 300mm

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1   Santa Clara, California
204494
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Ultima X CVD, 300mm:

Applied Materials, Ultima X CVD, 300mm

In the fab

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1   Singapore
204495
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Ultima X CVD, 300mm:

Applied Materials, Ultima X CVD, 300mm

 

In Fab.  Running.

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1   Singapore
205379
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Ultima X, HDP CVD, 300mm Oxide Deposition:

Applied Materials, Ultima X, HDP CVD, 300mm Oxide Deposition

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1   Singapore
205380
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Ultima X, HDP CVD, 300mm Oxide Deposition:

Applied Materials, Ultima X, HDP CVD, 300mm Oxide Deposition

Bagged & Skidded in Warehouse.

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1   Singapore
205381
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, Ultima X, HDP CVD, 300mm Oxide Deposition:

Applied Materials, Ultima X, HDP CVD, 300mm Oxide Deposition

 

Bagged & Skidded in Warehouse

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1   Singapore
205378
Applied Materials  

Applied Materials  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Applied Materials, UltimaX, HDP CVD, 300mm Oxide Deposition:

Applied Materials, UltimaX, HDP CVD, 300mm Oxide Deposition

 

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1   Singapore
183418
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:

ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2561

Serial Number: 2E0071-00-01


Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 Bagged & Skidded in warehouse.

Tool ID: FVX2561

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1   F* Malta, New York
183417
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:

ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2560

Serial Number: 2E0061-00-01

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

 

Installed Idle.

2011 Vintage

 

Tool ID: FVX2560

1   F* Malta, New York
183169
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:

ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2541

Serial Number: 2E0082

2011 Vintage

1   F* Malta, New York
196930
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

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ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation

Cold shutdown

Vintage 1997

S/N: 71F5669AE
1   F* Burlington, Vermont
196931
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

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ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation



S/N: 71F5669AC







1   F* Burlington, Vermont
196932
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation


Cold, Shutdown

S/N: 71F5669AE


1   F* Burlington, Vermont
201749
ASM  

ASM  

E3200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System:

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System

E3200 RP left hand

S/N : 34060

 

In the fab.  Cold idle.

1   Dresden, Saxony
201750
ASM  

ASM  

E3200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System E3200 RP:

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System

S/N : 034100


 

In the Fab.  Cold idle.

1   Dresden, Saxony
202901
ASM  

ASM  

Eagle XP8 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

ASM, EAGLE XP8, 300mm, CVD, PEALD HT/LT SiO:

ASM, EAGLE XP8, 300mm, CVD, PEALD HT/LT SiO

 

Crated in the Warehouse

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1   Dresden, Saxony
202902
ASM  

ASM  

Eagle XP8 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

ASM, EAGLE XP8, 300mm, CVD, PEALD HT/LT SiO:

ASM, EAGLE XP8, 300mm, CVD, PEALD HT/LT SiO

 

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1   Dresden, Saxony
184607
Astex  

Astex  

AX5000, AX6000, AX6350 or similar 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

Astex AX5000 Microwave Plasma Diamond Growth System:
  • Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production.
  • System can be rebuild based on customer's application needs using a combination of reliable, new and used/refurbished components.
  • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
  • 1.5kW to 5kW microwave power input.
  • 3 stage options: Cooled, Heated, or Thermally Floating.
  • Integration with computer controls is strongly recommended.
  • Chamber designs vary by vintage, but can be confirmed at the time of quotation.
1   F* Leominster, Massachusetts
137544
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Celsior mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

Aviza Celsior mainframe:
Aviza Celsior mainframe



Aviza Celsior mainframe
Equipment Code: CVD304-04

LOCATION: Dresden
1   F* Regensburg, BY
137540
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Pantheon Mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

Aviza Pantheon Mainframe:
Aviza Pantheon Mainframe
Equipment Code: CVD304-03


Aviza Pantheon Mainframe with 3 chambers
Serial Number: OX0412-005
1   F* Regensburg, BY
98056
Carbone  

Carbone  

G-III 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR:
Silicon Carbide 200 mm Disc Susceptor

Carbone of America Part number 017893-001
5   F* Scotia, NY
202651
Aixtron  

Aixtron  

Aixtron AIX2800G4 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

EPI Aixtron G4:

With many spare parts.

1   Villach, Carinthia
190993
Kokusai  

Kokusai  

Quixace Ultimate 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF:

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Low Temp Steam Anneal - for SOD Cure

S/N: T2DD6-18711

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1   Malta, New York
190748
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N T2DC6-16590

ALD TiN

Tool is New In Box, with New Quartz.  Never installed.
1   Malta, New York
190749
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N: T2DC6-16595

ALD TiN
1   Malta, New York
180506
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF:

Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
TiCl4, NH3 - Process for TiN - Prior Use

Cartridge Heater - D4EX22250, RHC2 Heater
Number of control zone, 5 zones
Heater element material - KANTHAL APM
Maximum heating temperature range - 1050 degC (in Furnace)
Flat zone length - 800mm (±2.0 degC at 800 degC)
Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
Main Operation Unit - TM150-HKT05 
Sub Operation Unit - D4EX40577
Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
Bottle (For Ti Source) - BK1200URK, Made by Schumacher
N2 Purge Load Lock System
O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

PUMPS INCLUDED.  See Photo attached.

S/N: T2DC6-15901

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1   F* Dresden, Saxony
194725
Kokusai  

Kokusai  

DD-1206V-DF 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace, 300mm, DD-1206V-DF:

Kokusai Quixace, 300mm, DD-1206V-DF

LP SiN 

S/N : T2DC6-13303

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1   Taichung, Taichung City
202834
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace, 300mm, DD-1206V-DF:

Kokusai Quixace, 300mm, DD-1206V-DF

 

 

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1   F* Malta, New York
205376
Kokusai  

Kokusai  

DD-1206-DF 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace, 300mm, DD-1206V-DF:
Kokusai Quixace, 300mm, DD-1206V-DF

In warehouse.  Bagged & Skidded

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1   Taichung, Taichung City
205395
Kokusai  

Kokusai  

 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace, 300mm, DD-1206V-DF, LPCVD SiN:

Kokusai Quixace, 300mm,  DD-1206V-DF, LPCVD SiN

 

Bagged & Skidded in Warehouse

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1   F* Taichung, Taichung City
205396
Kokusai  

Kokusai  

DD-1206-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

Kokusai Quixace, 300mm, DD-1206V-DF, LPCVD SiN:

Kokusai Quixace, 300mm, DD-1206V-DF, LPCVD SiN

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1   Taichung, Taichung City
190750
Kokusai  

Kokusai  

DD-1223VN 

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Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN:

Kokusai Quixace, 300mm, DD-1223VN

ALD-TiN 

S/N T2DC6-16441

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1   Malta, New York
204501
Kokusai  

Kokusai  

DJ-1206VN-DM, 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace, 300mm, DJ-1206VN-DM,:

Kokusai Quixace, 300mm,

LPCVD SiN,

 

S/N : T2DC6-12825

Bagged & Skidded in warehouse

 

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1   Singapore
204500
Kokusai  

Kokusai  

DJ-1206VN-DM 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN:

Kokusai Quixace, 300mm, DJ-1206VN-DM,

LPCVD SiN

S/N : T2DC6-12462

Bagged & Skidded in Warehouse

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1   Singapore
205392
Kokusai  

Kokusai  

DJ-1206VN-DM 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN:

Kokusai Quixace, 300mm, DJ-1206VN-DM,  LP SiN 

 

Bagged & Skidded in Warehouse.

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1   Singapore
203084
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

Kokusai Quixace, 300mm, DJ-1236VN-DF, TiN_ALD:

Kokusai Quixace, 300mm, DJ-1236VN-DF, TiN_ALD

In fab. Idle.

 

 

1   F* Malta, New York
199768
Kokusai  

Kokusai  

Quixace-II 

List all items of this typeVertical LPCVD Furnaces

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Kokusai Quixace, 300mm, Quixace-II:
Kokusai Quixace, 300mm, Quixace-II

Doped Poly




S/N: P2DC7-14115-1
1   Taichung, Taichung City
178278
Kokusai  

Kokusai  

Quixace 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

Kokusai, Quixace Ovens / Furnaces, 300mm:

Manufactured in 2007; Status: Bagged and Skidded
LPCVD Furnace  -  B-Doped Polysilicon
Tool is located in Taichung, Taiwan
S/N: P2DC7-14115-1

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1   Taichung, Taichung City
100429
Materials Technology  

Materials Technology  

02-01808 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR:
EPI 3 1/4" Barrel Susceptor

MTC EPI Reactor Parts
For 3 Inch Wafers
4   F* Scotia, NY
11074
Nexx Systems  

Nexx Systems  

Cirrus 300 

List all items of this typeSingle Chamber PECVD Tools

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NEXX SYSTEMS ECR PECVD RIE SYSTEM:
Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex

This system is designed for the fluorination of DLC surfaces on various substrates.
The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy.
High magnetic field launch produces a highly stable and efficient ECR plasma.

Nexx Systems Cirrus 300

1   F* Scotia, NY
201208
Novellus Systems  

Novellus Systems  

C2 Sequel Express 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Novellus, C2 Sequel Express, 200mm, CVD:

Novellus, C2 Sequel Express, 200mm, CVD

 

SINGLE CHAMBER ONLY !!  

S/N : D18276A

1   East Fishkill, New York
203110
Novellus Systems  

Novellus Systems  

C3 Altus Chamber 

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Novellus, C3 Altus Chamber, 300mm, CVD, Altus MAX EFX:

Novellus, C3 Altus Chamber, 300mm, CVD, Altus MAX EFX, Extreme Fill W

Cold Idle, in the Fab

S/N : D25323A

1   East Fishkill, New York
203109
Novellus Systems  

Novellus Systems  

C3 Altus Chambers 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

Novellus, C3 Altus Chamber, 300mm, CVD, Inflection FFWA Module (Fluorine Free W:

Novellus, C3 Altus Chamber, 300mm, CVD, Inflection FFWA Module (Fluorine Free W

 

1   East Fishkill, New York
181540
Oxford Instruments  

Oxford Instruments  

Plasmalab System 100 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

OXFORD INSTRUMENTS PLASMALAB 100 PECVD:
PECVD TEOS Tool with Load Lock
1   F* Scotia, NY
147470
Plasma-Therm  

Plasma-Therm  

790 PECVD 11" 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

PLASMATHERM PECVD 790:
Refurbished PECVD System with 11" Electrode
1   F* Scotia, NY
30246
Plasma-Therm  

Plasma-Therm  

VLR 700 VLR-PM1-ICRB-PM 

List all items of this typeCluster PECVD Tools

in Production Tools

PLASMATHERM VLR 700:
Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.
1   F* Scotia, NY
205391
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

SVG, AVP 8000 , 200mm Vertical Furnace, Cu Anneal:

SVG, AVP 8000 , 200mm Vertical Furnace, Cu Anneal

 

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1   F* Singapore
205236
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

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SVG, AVP 8000 AP, 200mm Vertical Furnace, Cu Anneal:

SVG, AVP 8000 AP, 200mm Vertical Furnace, Cu Anneal

 

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1   Singapore
205235
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 AP  

List all items of this typeVertical LPCVD Furnaces

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SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Ox:

SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Ox

remarketing@surplusglobal.com

1   Singapore
204517
Silicon Valley Group  

Silicon Valley Group  

VTR 7000 

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SVG, VTR 7000, 200mm, Arsenic TEOS, Furnace:

SVG, VTR 7000, 200mm, Arsenic TEOS, Furnace

 

S/N : V7B-326R

 

 

1   Burlington, Vermont
201292
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

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TEL Alpha 8 S, 200mm, Vertical Furnace, :

TEL Alpha 8 S, 200mm, Vertical Furnace, 

S/N :  300009665204

In Warehouse

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1   Singapore
201281
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8SE 

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TEL Alpha 8SE, HTO LPCVD , Furnace, 200mm:

TEL Alpha 8SE, HTO LPCVD , Furnace, 200mm

Bagged & Skidded in warehouse.

 

 

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1   Singapore
190746
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

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TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2:
TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2
1   Malta, New York
190747
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

List all items of this typeVertical LPCVD Furnaces

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TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2:

TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2

1   Malta, New York
204919
Tokyo Electron Ltd  

Tokyo Electron Ltd  

INDY PLUS - IRAD 

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TEL Indy PLUS, IRAD, Oxide, Vertical Furnace, 300mm:

TEL Indy PLUS, IRAD, Oxide, Vertical Furnace, 300mm

Crated.  In warehouse.

S/N: S00001525089

 

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1   Malta, New York
202829
Tel  

Tel  

Indy Plus 

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TEL Indy PLUS, Vertical Furnace, 300mm:

TEL Indy PLUS, Vertical Furnace, 300mm

1   Malta, New York
202830
Tel  

Tel  

Indy Plus 

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TEL Indy PLUS, Vertical Furnace, 300mm:

TEL Indy PLUS, Vertical Furnace, 300mm

1   Malta, New York
202831
Tel  

Tel  

Indy Plus 

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TEL Indy PLUS, Vertical Furnace, 300mm:

TEL Indy PLUS, Vertical Furnace, 300mm

1   Malta, New York
202832
Tel  

Tel  

Indy Plus 

List all items of this typeVertical LPCVD Furnaces

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TEL Indy PLUS, Vertical Furnace, 300mm:

TEL Indy PLUS, Vertical Furnace, 300mm

1   Malta, New York
202833
Tel  

Tel  

Indy Plus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

TEL Indy PLUS, Vertical Furnace, 300mm:

TEL Indy PLUS, Vertical Furnace, 300mm

1   Malta, New York
178714
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy + 

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TEL Indy, Vertical Furnace, 300mm:

PSZ (Poly-Silazane) Cure Furnace, 300mm
Heater: FTP VOS-56-101P 4zone / RT-1100 (C) / with RCU
Process Condition: AP+Sub-AP
MAX Operating Temp: 900degC

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1   F* Taichung, Taichung City
202926
Tel  

Tel  

IndyPlus 

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TEL IndyPlus, Vertical Furnace, 300mm, MLD SiN Deposition:

TEL IndyPlus, Vertical Furnace, 300mm, MLD SiN Deposition

 

In the Fab.  Idle

1   F* Dresden, Saxony
202930
Tel  

Tel  

Indy Plus 

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1   Dresden, Saxony
202931
Tel  

Tel  

Indy Plus 

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in LPCVD Furnaces

TEL IndyPlus, Vertical Furnace, 300mm, MLD SiN Deposition:

TEL IndyPlus, Vertical Furnace, 300mm, MLD SiN Deposition

 

1   Dresden, Saxony
204301
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, DCS HTO:

TEL, Alpha 303i, 300mm Vertical Furnace, DCS HTO

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1   Singapore
204297
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly:

TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly

1   Singapore
204298
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly:

TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly

1   Singapore
204299
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly:

TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly

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1   Singapore
204300
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

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TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly:

TEL, Alpha 303i, 300mm Vertical Furnace, LP P-doped Poly

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1   Singapore
204296
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, LP SiN:

TEL, Alpha 303i, 300mm Vertical Furnace, LP SiN

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1   Singapore
195346
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, LT SOD cure:

TEL, Alpha 303i, 300mm Vertical Furnace, LT SOD cure

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1   Taichung, Taichung City
204315
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, P-Doped Poly:

TEL, Alpha 303i, 300mm Vertical Furnace, P-Doped Poly

 

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1   Singapore
204295
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

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TEL, Alpha 303i, 300mm Vertical Furnace, PH3 Anneal:

TEL, Alpha 303i, 300mm Vertical Furnace, PH3 Anneal

Mid Temp

Bagged & Skidded in warehouse

1   Taichung, Taichung City
178252
Tel  

Tel  

Trias 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

TEL, CVD, 300mm:
Manufactured in 2010; Status: Crated


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire
1   Taichung, Taichung City


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment:
AG Associates, Aixtron, Applied Materials, Inc., ASM, Astex, Aviza Technology Ltd., Carbone, Kokusai, Materials Technology, Nexx Systems, Novellus Systems, Oxford Instruments, Plasma-Therm, Silicon Valley Group, Tel, Tokyo Electronics Limited