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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
56326
Applied Materials  

Applied Materials  

P5000 

List all items of this typeCluster PECVD Tools

in Production Tools

APPLIED MATERIALS AMAT P5000 MARK II SYSTEM:
AMAT P5000 Mark II Hybrid System.
Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel.
Integrated endpoint system with 2 monochromators.
Currently configured for 100mm wafers.


System is fully configurable to your specifications..
1   F* Scotia, NY
23215
Applied Materials  

Applied Materials  

P5000 MARK II 

List all items of this typeCluster PECVD Tools

in Production Tools

APPLIED MATERIALS AMAT TEOS DEPOSITION, OXID ETCH, P5000:
Mark II System
TEOS Deposition, Oxide Etch
1   F* Scotia, New York
184607
Astex  

Astex  

AX5000, AX6000, AX6350 or similar 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

Astex AX5000 Microwave Plasma Diamond Growth System:
  • Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production.
  • System can be rebuild based on customer's application needs using a combination of reliable, new and used/refurbished components.
  • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
  • 1.5kW to 5kW microwave power input.
  • 3 stage options: Cooled, Heated, or Thermally Floating.
  • Integration with computer controls is strongly recommended.
  • Chamber designs vary by vintage, but can be confirmed at the time of quotation.
1   F* Leominster, Massachusetts
11074
Nexx Systems  

Nexx Systems  

Cirrus 300 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

NEXX SYSTEMS ECR PECVD RIE SYSTEM:
Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex

This system is designed for the fluorination of DLC surfaces on various substrates.
The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy.
High magnetic field launch produces a highly stable and efficient ECR plasma.

Nexx Systems Cirrus 300

1   F* Scotia, NY
181540
Oxford Instruments  

Oxford Instruments  

Plasmalab System 100 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

OXFORD INSTRUMENTS PLASMALAB 100 PECVD:
PECVD TEOS Tool with Load Lock
1   F* Scotia, NY
147470
Plasma-Therm  

Plasma-Therm  

790 PECVD 11" 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

PLASMATHERM PECVD 790:
Refurbished PECVD System with 11" Electrode
1   F* Scotia, NY
30246
Plasma-Therm  

Plasma-Therm  

VLR 700 VLR-PM1-ICRB-PM 

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PLASMATHERM VLR 700:
Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.
1   F* Scotia, NY


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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Items from the following manufacturers are offered under Production Tools:
Applied Materials, Inc., Astex, Nexx Systems, Oxford Instruments, Plasma-Therm