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Two Stage Rotary Vacuum Vacuum Pump 
Pumping speed and ultimate pressure are based on 60 Hz operation.

Custom built for industrial R&D, this high plasma power density system is activated by ECR-enhanced, 2.45GHz microwave input offers a unique design for PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures.

Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching.

This system was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with ECR magnets.

• This in-stock equipment is offered for domestic sale within the USA only. 
• Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
• Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD).
• System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety:
  • Chamber cleaning,
  • Computer control updates,
  • Higher throughput water cooling subsystem,
  • Replacement of selected o-ring components with metal seals, and
  • Enhanced process control/monitoring devices.
• The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
• Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
• Photo Note: System photo shown include a similar quality, similar vintage system sold in the past.  Actual photos or inspection available to qualified customers only.

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Rebuilt Turbo Pump

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