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Mass Flow Controllers - Gas
BROOKS INSTRUMENT MASS FLOW CONTROLLER, 50 SCCM Offered 2 Offered at Best Price

BROOKS INSTRUMENT MASS FLOW CONTROLLER, 50 SCCM



Turbo Pumps
PFEIFFER TURBO PUMP WITH OBC V4 PROFIBUS CONTROLLER Offered 1 Offered at Best Price

PFEIFFER TURBO PUMP WITH OBC V4 PROFIBUS CONTROLLER



Vacuum Pump Accessories
PFEIFFER HEATER BAND CABLE 3.5M Offered 2 Offered at Best Price

PFEIFFER HEATER BAND CABLE 3.5M



Added  Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
Apr 29 257348
AMAT  

AMAT  

DXZ/CXZ Chamber 

List all items of this typeCluster PECVD Tools

in Production Tools

3 DXZ/CXZ Chambers for Centura/P5000:

3 DXZ/CXZ Chambers for Centura/P5000
Mainframe is transport rack

 
1   N* Villach, Kärnten
Apr 25 257320
Pfeiffer Vacuum  

Pfeiffer Vacuum  

ATH 500 M 

List all items of this typeTurbo Pumps

in Vacuum Pumps

PFEIFFER VACUUM TURBO PUMP 550 L/S MAG LEV:

New Surplus

7   N* Scotia, New York
Apr 18 257253
Electronic Measuremt  

Electronic Measuremt  

EMS 27-185-2D-10/T 

List all items of this typeDC Power Supplies

in PVD Power Supplies

ELECTRONIC MEASUREMENTS DC POWER SUPPLY, 27V, 185A:

DC Power Supply

Manufactured for Astex

 

1 1,395.37 N* Scotia, New York
Apr 18 257252
MKS Instruments, Inc  

MKS Instruments, Inc  

286 

List all items of this typeThermocouple Gauge Controllers

in Vacuum Gauge Controllers

MKS 286 Dual THERMOCOUPLE GAUGE CONTROLLER:

MKS 286 Dual Thermocouple Gauge Controller

2   N* Scotia, New York
Apr 18 257251
MKS instruments  

MKS instruments  

270C-0 

List all items of this typeCapacitance Gauge Controllers

in Vacuum Gauge Controllers

MKS INSTRUMENTS INC. 270C-0 SIGNAL CONDITIONER (DISPLAYLESS):

High Accuracy Signal Conditioner  (DISPLAYLESS)

1 600.16 N* Scotia, New York
Apr 17 257176
AMAT  

AMAT  

EPI Centura ACP 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

EPI Centura ACP 300mm "Yu Shan":

Brand new and unused EPI Centura ACP 300 mm

4 Chambers;  Chamber code RH3, Lamp type BNA8 R3
Mainframe Configuration E4 Single, 4 Facet SC ENP BLK2, Loadport AMAT Standard 300mm, EPI Water Module LT Design.

Tool out of Project: "Yu Shan"

The original rough IFX Equipment procurement value was 10,3 M€

Will be now sold for an attractive price.

 Equipment is... 

...brand new 

...never used  

...original packaged and crated 

...located in Asia 

...complete and fully functional 

...professional stored in Warehouse

1   N* Regensburg, Bavaria
Apr 17 257169
AMAT  

AMAT  

PRODUCER SE 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   N* Dresden, Saxony
Apr 17 257168
AMAT  

AMAT  

PRODUCER SE 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   N* Dresden, Saxony
Apr 17 257167
AMAT  

AMAT  

PRODUCER SE 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   N* Dresden, Saxony
Apr 1 256818
Balzers-Pfeiffer  

Balzers-Pfeiffer  

TPH 062 

List all items of this typeTurbo Pumps

in Vacuum Pumps

BALZERS/PFEIFFER TURBO PUMP 56 L/S:

Turbo Pump

1   N* Scotia, New York
Mar 27 256746
AMAT  

AMAT  

HDP Centura 

List all items of this typeCluster PECVD Tools

in Production Tools

AMAT Centura HDP:

Software: Win 10

OR 4000 WTM Controller

3x ENI Generator Racks

Chiller INR-498-011D

2x Remote Monitor

High Density Plasma Process

Process Chambers: A,B,C

Orienter chamber F

1   N* Regensburg, Bavaria
Mar 25 256633
Henkovac  

Henkovac  

E-302 

List all items of this typeVacuum Equipment - Other

in ALL CATEGORIES

Vacuum Sealer:

Seal the Moisture Barrier Bag (MBB).

Location is at Infineon Penang.

1   N* George Town, Penang
Mar 12 256294
Nexx Apollo PVD 
Nexx Apollo PVD 

List all items of this typeHorizontal Sputterers

in Batch Sputtering Tools

Nexx Apollo PVD:

The Nexx Apollo PVD system is a fully automated Physical Vapor Deposition (PVD) tool using a multiple wafer multiple chamber design. The system deposits thin metal films used in interconnect metallization on wafers. It uses a staged vacuum system that allow short pump down time to achieve ultra high vacuum. The multi chamber design allows for precise control over all process parameters.

1   N* Kulim, Kedah


*  Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.