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Chemical Vapor Deposition Equipment


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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
109694
12-inch (300mm) HFCVD System for CVD Diamond & Related Materials  
12-inch (300mm) HFCVD System for CVD Diamond & Related Materials  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Sterling, MA
12-inch (300mm) HFCVD System for CVD Diamond & Related Materials :
  • Hot Filament CVD system engineered for diamond deposition on a 12 inch (~300mm) rotary platen.
  • Design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

    This equipment was engineered and used by an industrial entity for commercial CVD production using a hydrogen-based process. 2-chamber system design includes loading chamber and HFCVD hot zone separated by large gate valve. This design enables continuous operation of filaments for many days without shutdown. Equipment employs a 4-zone filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. Large HFCVD hot zone and push rod design enable substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species. Specialty, water-cooled MDC chambers maintain low temperature chamber wall while substrate is heated to elevated temperatures via atomic hydrogen recombination and radiational heating.

    Deposition over >12 inch diameter or coating on 3-D shapes should be viable with process and fixture development.

    Images of a typical HFCVD system installation are attached.
115857
4-inch HFCVD System for CVD Diamond and Related Materials 
4-inch HFCVD System for CVD Diamond and Related Materials 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Sterling, MA
4-inch HFCVD System for CVD Diamond and Related Materials:
  • Hot Filament CVD system engineered for diamond deposition on a 4 inch (~100mm) rotary platen.
  • System design offers excellent potential for diamond, CNTs & related nanomaterials processing for both R&D and/or production.

This equipment was previously used for commercial R&D of polycrystalline CVD Diamond materials.

Design employs a 2-zone vertically-oriented filament array with independent controls for each zone. Rotary stage maximizes deposition uniformity. External substrate manipulation enables substrate-to-filament distance control. Refractory metal filaments can operate at >2000C and enable thermal decomposition of H2 and hydrocarbons into activated species.

Cline Innovations intends to refurbish and reintegrate this system with updated controls and interlocks, likely including PLC process monitoring, LCD display, pneumatic controls, and other features.  Tailoring of design to meet customer needs may be possible.  Run-off testing is possible prior to shipment.

177729
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Regensburg, BY
AMAT P5000 - PE Oxide Dep - 6":
AMAT P5000 - PE Oxide Dep Tool
2 DxZ Chamber - Both PE - Silane 6" Si
Currently Installed in Fab, Good Working Condition
56326
Applied Materials  

Applied Materials  

P5000 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT P5000 MARK II SYSTEM:
AMAT P5000 Mark II Hybrid System.
Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel.
Integrated endpoint system with 2 monochromators.
Currently configured for 100mm wafers.


System is fully configurable to your specifications..
23215
Applied Materials  

Applied Materials  

P5000 MARK II 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
APPLIED MATERIALS AMAT TEOS DEPOSITION, OXID ETCH, P5000:
Mark II System
TEOS Deposition, Oxide Etch
192949
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
Applied Materials, AMAT, P5000 Mark II, PECVD, 200mm:
Applied Materials,  AMAT,  P5000 Mark II, PECVD, 200mm

2 Chamber SABPSG 

Has Precision Liquid Injection System with Dual-Tank Liquid Refill System.

Runs SABPSG process, not using Hot Box.


194539
Applied Materials  

Applied Materials  

Centura Gigafill CVD 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
Applied Materials, Centura, Gigafill, CVD, 200mm:
Applied Materials, Centura, Gigafill, CVD, 200mm

Bagged & Skidded in Warehouse

S/N : 21826


195361
Applied Materials  

Applied Materials  

Producer SE 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F*N* Taichung, Taichung City
Applied Materials, Producer SE CVD, 300mm, SABPTEOS:
Applied Materials, Producer SE CVD, 300mm, SABPTEOS

S/N : 409699

!!!MULTIPLE UNITS AVAILABLE!!! Please inquire
191517
Applied Materials  

Applied Materials  

Producer 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Singapore,
Applied Materials, Producer, Standard, 200mm:
Applied Materials, Producer, Standard, 200mm

S/N: 004877
191518
Applied Materials  

Applied Materials  

Producer 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Singapore,
Applied Materials, Producer, Standard, 200mm:
Applied Materials, Producer, Standard, 200mm

S/N:
178245
AMAT  

AMAT  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Taichung, Taichung City
Applied Materials, Ultima X CVD, 300mm:
Manufactured in 2007; Status: Bagged and Skidded

!!! MULTIPLE UNITS AVAILABLE!!! Please inquire
192827
Applied Materials  

Applied Materials  

UltimaX 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Taichung, Taichung City
Applied Materials, Ultima X CVD, 300mm:
Applied Materials, Ultima X CVD, 300mm

Bagged & Skidded in Warehouse

414185


Parts Missing:
qty. 1 HEAT EXCHANGER, SINGLE LOOP, 208V, 50/60
qty. 1 HEAT EXCHANGER, SINGLE LOOP, 208V, 50/60
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 ASSY, GROUND SHIELD, 300MM ULTIMA X
qty. 1 Side coil assembly

183418
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2561

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2561

183417
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2560

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2560

183169
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, NY
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2541

2011 Vintage
183170
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2540

2011 Vintage

 

Tool ID: FVX2541

 
195174
ASM  

ASM  

E3200  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:
ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System
Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

184607
Astex  

Astex  

AX5000, AX6000, AX6350 or similar 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Astex AX5000 Microwave Plasma Diamond Growth System:
  • Multiple stainless steel, Astex microwave plasma CVD chambers and plasma couplers currently available as the basis for refurbishment and reintegration.
  • Systems can be reintegrated based on customer's application needs using a combination of reliable, new and used/refurbished components.
  • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
  • 1.5kW to 5kW microwave power input.
  • 3 stage options: Cooled, Heated, or Thermally Floating.
  • Computer controls.
189843
Astex  

Astex  

AX6500 "Clamshell" MPCVD 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F*N* Leominster, Massachusetts
Astex AX6500 Diamond Growth System:
  • Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
  • Capable of high rate single-crystal (SCD) diamond homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD), ultrananocrystalline diamond (UNCD).
  • System to be refurbished & updated with modernized computer controls, higher throughput water cooling subsystem, and enhanced process control/monitoring devices.
  • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
  • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
  • This system can be customized to meet customer needs and preferences.  Please contact Cline Innovations for details.
137483
Astex  

Astex  

ECR-MOCVD-PECVD 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD):
High density plasma system activated by 2.45GHz ECR microwave offers low temperature plasma for PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, diamond & related carbon materials, and nanomaterials.

Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area/volume MOCVD/PECVD/deposition of ceramics/semiconductors/DLC/nanodiamond/nanomaterials, surface treatment & functionalization and/or dry etching.

This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.

137544
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Celsior mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Celsior mainframe:
Aviza Celsior mainframe



Aviza Celsior mainframe
Equipment Code: CVD304-04

LOCATION: Dresden
137540
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Pantheon Mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Pantheon Mainframe:
Aviza Pantheon Mainframe
Equipment Code: CVD304-03


Aviza Pantheon Mainframe with 3 chambers
Serial Number: OX0412-005
98056
Carbone  

Carbone  

G-III 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

5   F* Scotia, NY
CARBONE SILICON CARBIDE 200mm DISC SUSCEPTOR:
Silicon Carbide 200 mm Disc Susceptor

Carbone of America Part number 017893-001
187926
Cline Innovations  

Cline Innovations  

Custom CVD Diamond System 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Leominster, MA
Custom CVD Diamond Systems:

Cline Innovations is now designing and building custom microwave plasma CVD systems for technically discerning customers.  Please contact us to discuss your advanced CVD diamond process specifications.

137566
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (NITRID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Furnace TEL Minibatch (NITRID):
OfenTel Minibatch (NITRID)
Equipment Code: OFE361-01

TEL Formula Minibatch furnace for Nitride, 4


OfenTel Minibatch (NITRID)
Serial Number: P00000315001
137567
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (OXID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
FurnaceTel Minibatch (OXID):
OfenTel Minibatch (OXID)
Equipment Code: OFE361-02

TEL Formula Minibatch furnace for Oxide


OfenTel Minibatch (OXID)
Serial Number: P00000315002
190993
Kokusai  

Kokusai  

Quixace Ultimate 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF:

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Low Temp Steam Anneal - for SOD Cure

S/N: T2DD6-18711

190748
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N T2DC6-16590

ALD TiN

Tool is New In Box, with New Quartz.  Never installed.
190749
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N: T2DC6-16595

ALD TiN
180506
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Dresden, SN
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF:
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
TiCl4, NH3 - Process for TiN - Prior Use

Cartridge Heater - D4EX22250, RHC2 Heater
Number of control zone, 5 zones
Heater element material - KANTHAL APM
Maximum heating temperature range - 1050 degC (in Furnace)
Flat zone length - 800mm (±2.0 degC at 800 degC)
Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
Main Operation Unit - TM150-HKT05 
Sub Operation Unit - D4EX40577
Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
Bottle (For Ti Source) - BK1200URK, Made by Schumacher
N2 Purge Load Lock System
O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

S/N: T2DC6-15901
194725
Kokusai  

Kokusai  

DD-1206V-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
Kokusai Quixace, 300mm, DD-1206V-DF:
Kokusai Quixace, 300mm, DD-1206V-DF

LP SiN 

S/N : T2DC6-13303

!!! MULTIPLE UNITS AVAILABLE !!!  Please inquire
195354
Kokusai  

Kokusai  

DD-1206V-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
Kokusai Quixace, 300mm, DD-1206V-DF:
Kokusai Quixace, 300mm, DD-1206V-DF

Pyro + TLC 


S/N: T2DC6-17017


!!! MULTIPLE UNITS AVAILABLE!!! Please inquire
195355
Kokusai  

Kokusai  

DD-1206VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
Kokusai Quixace, 300mm, DD-1206VN-DF:
Kokusai Quixace, 300mm, DD-1206VN-DF


PYRO + TLC



S/N: T2DD6-16872

!!! MULTIPLE UNITS AVAILABLE!!!  Please inquire
190750
Kokusai  

Kokusai  

DD-1223VN 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN:
Kokusai Quixace, 300mm, DD-1223VN

ALD-TiN 

S/N T2DC6-16441
195356
Kokusai  

Kokusai  

DJ-1206VN-DM 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F*N* Singapore,
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN:
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN

S/N : T1DC6-13301

!!!Multiple Units Available!!!  Please inquire
186717
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Singapore,
Kokusai, 200mm, DJ-853V, LPCVD SiN S:
Kokusai, 200mm, DJ-853V, LPCVD SiN 

100429
Materials Technology  

Materials Technology  

02-01808 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

4   F* Scotia, NY
MATERIALS TECHNOLOGY CORPORATION BARREL SUSCEPTOR:
EPI 3 1/4" Barrel Susceptor

MTC EPI Reactor Parts
For 3 Inch Wafers
192253
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Stratus S200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Villach, Carinthia
NEXX Stratus 200:

Stratus 200 is high volume manufacturing electroplating system for advanced wafer level packaging (WLP) applications

11074
Nexx Systems  

Nexx Systems  

Cirrus 300 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
NEXX SYSTEMS ECR PECVD RIE SYSTEM:
Low Temperature CVD Using ECR Technology. Formerly PlasmaQuest Astex

This system is designed for the fluorination of DLC surfaces on various substrates.
The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy.
High magnetic field launch produces a highly stable and efficient ECR plasma.

Nexx Systems Cirrus 300

181540
Oxford Instruments  

Oxford Instruments  

Plasmalab System 100 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
OXFORD INSTRUMENTS PLASMALAB 100 PECVD:
PECVD TEOS Tool with Load Lock
191492
Picosun  

Picosun  

Sunale R-200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   East Fishkill, New York
Picosun, Sunale R-200, Advanced ALD Reactor, 300mm:
Picosun, Sunale R-200, Advanced ALD Reactor, 300mm

Configured with three canisters and chemicals to deposit Ni, HfO, Ru and SiO, Al

SUNALETM R-200 Advanced ALD System
The ALD reactor has six separate inlets for precursor sources. It can accommodate up to twelve precursor sources. Maximum deposition temperature of the ALD reactor is 500 °C.

 Vacuum chamber (AISI304)

AISI 304 stainless steel vessel with KF/CF connection flanges for RC-200 reaction chamber.

Reaction Chamber (AISI316L)
RC-200 Chamber and lid with metal sealing surface. Customer specified chamber size up to 8”single Si wafer or smaller wafers (4”, 6”) and pieces

Sample holder SH-200
Substrate holder for one up to 8” wafer or smaller wafers (4”, 6”) and pieces compatible with reaction chamber

Advanced source control and electronics system
Touch panel PC and electronics cabinet used for operating the ALD reactor with Advanced 12-source ALD software and electronics

PicosolutionTM 600 source system

Cooled source systems for high vapor pressure liquid precursors (e.g. for TMA, TiCl4 and H2O). Maximum capacity 600mL. 3ea.

Boosted PicohotTM 200 source system

Heated source systems (up to 200 °C) for low vapor pressure metal precursors (e.g. for TEMAHf, TEMAZr). Suitable also for high vapor pressure chemicals.  2ea.

PicohotTM 300 source system

Heated source system (up to 300 °C) for low vapor pressure metal precursors (e.g. for HfCl4, ZrCl4).  1ea.

PicogasesTM Connection

Allows for the connection of an additional externally supplied compressed gas for use as an ALD precursor (e.g. NH3, O2). Includes plumbing, valves, and control of extra gas source.

DOM:6/18/2013

147470
Plasma-Therm  

Plasma-Therm  

790 PECVD 11" 

List all items of this typeSingle Chamber PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM PECVD 790:
Refurbished PECVD System with 11" Electrode
30246
Plasma-Therm  

Plasma-Therm  

VLR 700 VLR-PM1-ICRB-PM 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Scotia, NY
PLASMATHERM VLR 700:
Single Chamber PECVD. Mixed Frequency Deposition
(MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz)
RF power delivered both electrodes.
191258
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, AP, Forming Gas Anneal 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace:

SVG, AVP 8000 AP, 200mm Vertical Furnace

S/N: 4272

Cu Anneal (Single Boat)

191268
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, Gate Ox 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation:
SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation

Thermal Gate Oxideation furnace

S/N: 4252
191275
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 LP Poly 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace, LPCVD Poly:
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD Poly (Plain Poly)

S/N: 4257
191277
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 LP TEOS 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace, LPCVD TEOS:
SVG, AVP 8000 LP, 200mm Vertical Furnace

LPCVD TEOS

S/N: 4425
191274
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, AP, Oxidation 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Singapore,
SVG, AVP 8000 LP, 200mm Vertical Furnace, Oxidation:
SVG, AVP 8000 LP, 200mm Vertical Furnace, Oxidation

S/N: 4409


178238
SVG  

SVG  

WJ TEOS 1500 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
SVG, CVD, WJ TEOS 1500 200mm:
Manufactured in 2008; Status: Bagged and Skidded
187653
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace:

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009820055

Bagged & Skidded in Warehouse
187654
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace:

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009870082

Bagged & Skidded in Warehouse
187655
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace:

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009870082

Bagged & Skidded in Warehouse

 

 

187656
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace:

TEL Alpha 8 S, 200mm, Vertical Furnace

TEL Alpha 8 S, 200mm, Vertical Furnace, 

LINE BUY TOOL ___  NO CONFIGURATION INFORMATION AVAILABLE


S/N: A00009870082

Bagged & Skidded in Warehouse
190268
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace, Doping:
TEL Alpha 8 S, 200mm, Vertical Furnace, Doping

S/N: A00009755276
187658
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8 S 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride:
TEL Alpha 8 S, 200mm, Vertical Furnace, LPCVD Nitride

S/N: 300009675379

In the Fab in Singapore
189686
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace, Polysilicon :
TEL Alpha 8 S, 200mm, Vertical Furnace, Polysilicon 

S/N: A00009815018

Bagged & Skidded in Warehouse.
189147
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
TEL Alpha 8 S, 200mm, Vertical Furnace, SOG Cure:
TEL Alpha 8 S, 200mm, Vertical Furnace, SOG Cure

In Warehouse, Bagged & Skidded

S/N: A00009795484
178712
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy + 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
TEL Indy +, Vertical Furnace, 300mm:
TEL Indy +, Vertical Furnace, 300mm

LP ALD
194724
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy Plus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
TEL Indy +, Vertical Furnace, 300mm:
TEL Indy +, Vertical Furnace, 300mm


190746
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2:
TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2
190747
Tokyo Electron Ltd  

Tokyo Electron Ltd  

IndyPlus 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
TEL Indy +, Vertical Furnace, 300mm, ALD-HfO2:

TEL Indy +, Vertical Furnace, 300mm

ALD-HfO2

178714
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Indy + 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
TEL Indy, Vertical Furnace, 300mm:
PSZ (Poly-Silazane) Cure Furnace, 300mm
Heater: FTP VOS-56-101P 4zone / RT-1100 (C) / with RCU
Process Condition: AP+Sub-AP
MAX Operating Temp: 900degC

137546
Tokyo Electron Ltd  

Tokyo Electron Ltd  

TEL Trias TI/TiN-ALD for 12" / 300 mm 

List all items of this typeCluster PECVD Tools

in Production Tools

1   F* Regensburg, BY
TEL Trias TI/TiN-ALD :
TEL Trias TI/TiN-ALD
Equipment Code: CVD314-02


TEL Trias TI/TiN-ALD
Serial Number: C13503
137543
TEL Corp.  

TEL Corp.  

TEL Trias TI/TiN-ALD for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
TEL Trias TI/TiN-ALD :
TEL Trias TI/TiN-ALD
Equipment Code: CVD314-01


TEL Trias TI/TiN-ALD
Serial Number: C10503
195347
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
TEL, Alpha 303i, 300mm Vertical Furnace, Low Temp:
TEL, Alpha 303i, 300mm Vertical Furnace, Low Temp

S/N: L00000615007

Known Parts Missing:

qty. 1 Carrier ARM cable line-XS235IO
qty. 1 Carrier ARM cable line-XS232IO
qty. 3 UPS battery, 12V 5.5Ah in series 3, TEL

195346
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
TEL, Alpha 303i, 300mm Vertical Furnace, LT SOD cure:
TEL, Alpha 303i, 300mm Vertical Furnace, LT SOD cure
195348
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 303i 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Santa Clara, California
TEL, Alpha 303i, 300mm Vertical Furnace, P-Doped Poly:
TEL, Alpha 303i, 300mm Vertical Furnace, P-Doped Poly

S/N : L00000735083


189682
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
TEL, Aplha 8 S, 200mm, Vertical Furnace, Doped Poly:
TEL, Aplha 8 S, 200mm, Vertical Furnace,  Doped Poly

S/N: 300009645188
192952
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Alpha 8S  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
TEL, Aplha 8 S, 200mm, Vertical Furnace, LPCVD Doped Poly:
TEL, Aplha 8 S, 200mm, Vertical Furnace, LPCVD Doped Poly

S/N : A00009835236
178252
Tel  

Tel  

Trias 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Taichung, Taichung City
TEL, CVD, 300mm:
Manufactured in 2010; Status: Crated


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire
178249
Tel  

Tel  

Trias 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Taichung, Taichung City
TEL, Trias CVD, 300mm:
Manufactured in 2005; Status: Bagged and Skidded
187585
Tel  

Tel  

Trias 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Fishkill, NY
TEL, Trias, UVRF / High-K CVD / SPA-N / LPA modules, 300mm :
TEL, Trias, UVRF / High-K CVD / SPA-N / LPA modules

TEL Trias Platform
178241
Watkins-Johnson  

Watkins-Johnson  

TEOS 1500 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   Singapore,
WJ, CVD, TEOS 1500 200mm:
TEOS 1500  Status: In Warehouse
178242
Watkins-Johnson  

Watkins-Johnson  

TEOS 1500 

List all items of this typeAtmospheric Pressure CVD Tools

in Chemical Vapor Deposition Equipment

1   F* Singapore,
WJ, CVD, TEOS 1500 200mm:
TEOS 1500  Status: Bagged & Skidded


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment:
AG Associates, Applied Materials, Inc., ASM, Astex, Aviza Technology Ltd., Carbone, Cline Innovations, Kokusai, Materials Technology, Nexx Systems, Oxford Instruments, Picosun, Plasma-Therm, Silicon Valley Group, Tel, TEL Corp., Tokyo Electronics Limited, Watkins-Johnson