| Item ID |
Short Description |
Product Type / Details |
#
|
Price |
Note |
Location |
| Make |
Model |
| |
|
$ |
|
 |
4667 |
Advanced Crystal Sci |
ACS500 |
in LPCVD Furnaces
|
1
|
|
|
F* |
Scotia, NY |
| |
ADVANCED CRYSTAL SCIENCES INC. ACS500 Chemical Vapor Deposition System |
 |
122997 |
Applied Materials |
Centura 5200 iSprint |
in Production Tools
|
1
|
|
|
F*N* |
Scotia, NY |
| |
APPLIED MATERIALS CENTURA ISPRINT TUNGSTEN ALD CVD Model: 5200
Year 2008 System |
 |
23215 |
Applied Materials |
P5000 MARK II |
in Production Tools
|
1
|
|
|
  |
Scotia, NY |
| |
APPLIED MATERIALS P5000 Mark II System
TEOS Deposition, Oxide Etch |
 |
118947 |
Applied Materials |
|
in Production Tools
|
1
|
|
150,000.00
|
F* |
Dallas, TX |
| |
Applied Materials P5000 CVD System S/N 4332 |
 |
118074 |
Applied Materials |
P5000 |
in Production Tools
|
1
|
|
537,000.00
|
F* |
Dallas, TX |
| |
Applied Materials P5000 Three Chamber CVD Nitride Etcher |
 |
118078 |
Applied Materials |
P5000 |
in Production Tools
|
1
|
|
537,000.00
|
F* |
Dallas, TX |
| |
Applied Materials P5000 Two TEOS CVD & Plasma Etch MxP Etch |
 |
56326 |
Applied Materials |
P5000 |
in Production Tools
|
1
|
|
|
F* |
Scotia, NY |
| |
APPLIED MATERIALS P5000 MARK II SYSTEM System is fully configurable to your specifications..
|
 |
98056 |
Carbone |
G-III |
in Epitaxial Reactors
|
5
|
|
|
F* |
Scotia, NY |
| |
CARBONE G-III Carbone of America Part number 017893-001 |
 |
100429 |
Materials Technology |
02-01808 |
in Epitaxial Reactors
|
4
|
|
|
F* |
Scotia, NY |
| |
MATERIALS TECHNOLOGY CORPORATION 02-01808 MTC EPI Reactor Parts
For 3 Inch Wafers |
 |
11074 |
Nexx Systems |
Cirrus 300 |
in Production Tools
|
1
|
|
|
F* |
Scotia, NY |
| |
NEXX SYSTEMS CIRRUS 300 This system is designed for the fluorination of DLC surfaces on various substrates. The ECR zone is produced by a Nd-Fe-B permanent magnet which produces a high magnetic field launch of the microwave energy. High magnetic field launch produces a highly stable and efficient ECR plasma. |
 |
102415 |
Novellus Systems |
C1 |
in Chemical Vapor Deposition Equipment
|
1
|
|
180,000.00
|
 |
Dallas, TX |
| |
Novellus C1 Passivation CVD |
 |
102343 |
Novellus Systems |
C1 |
in Chemical Vapor Deposition Equipment
|
1
|
|
180,000.00
|
  |
Dallas, TX |
| |
Novellus C1 Teos CVD |
 |
102403 |
Novellus Systems |
C1 |
in Chemical Vapor Deposition Equipment
|
1
|
|
180,000.00
|
 |
Dallas, TX |
| |
Novellus C1 Teos CVD |
 |
102418 |
Novellus Systems |
C1 |
in Chemical Vapor Deposition Equipment
|
1
|
|
180,000.00
|
F* |
Dallas, TX |
| |
Novellus C1 W CVD S/N 797 |
 |
102419 |
Novellus Systems |
C1 |
in Chemical Vapor Deposition Equipment
|
1
|
|
180,000.00
|
 |
Dallas, TX |
| |
Novellus C1 W CVD S/N 95-46-2022 |
 |
78045 |
Novellus Systems, In |
Concept 1-W |
in Production Tools
|
1
|
|
|
F* |
Plano, TX |
| |
Novellus Concept One-W(200) W-CVD Tungsten |
 |
76093 |
Novellus Systems, In |
Concept One-W(200) |
in Production Tools
|
1
|
|
|
F* |
Austin, TX |
| |
Novellus Concept One-W(200) 200mm Novellus Concept One-W(200) CVD Tungsten Deposition System |
 |
30246 |
Plasmatherm |
VLR 700 VLR-PM1-ICRB-PM |
in Production Tools
|
1
|
|
|
F* |
Scotia, NY |
| |
PLASMATHERM VLR 700 Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (400 kHz) RF power to be delivered to the powered electrode. |
 |
98057 |
SGL Carbon Corporati |
24" Pancake Suspector |
in Epitaxial Reactors
|
10
|
|
|
F* |
Scotia, NY |
| |
SGL CARBON CORPORATION EPITAXIAL SUSCEPTOR 24" Crysta-Sil Pancake Susceptor |
 |
89818 |
Silicon Valley Group |
VTR-7000 |
in LPCVD Furnaces
|
1
|
|
|
F* |
Austin, TX |
| |
SVG VTR-7000 200mm SVG VTR-7000 LPCVD Vertical Diffusion Furnace |
 |
89819 |
Silicon Valley Group |
VTR-7000 |
in LPCVD Furnaces
|
1
|
|
|
F* |
Austin, TX |
| |
SVG VTR-7000 200mm SVG VTR-7000 Arsenic Doped TEOS Vertical Diffusion Furnace |
 |
97700 |
Kokusai |
Vertron DJ-835V-8BL |
in LPCVD Furnaces
|
1
|
|
90,000.00
|
F* |
Regensburg, BY |
| |
Vertron DJ-835V-8BL LOCATION: Villach SERIAL NUMBER(S): T2DC2-11634-1 |
 |
100018 |
Watkins-Johnson |
1000H |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
F* |
Plano, TX |
| |
WATKINS JOHNSON 1000H Hydride Based APCVD Tool |