Serving  Our Guest Log in    RegisterHow to post your own listings   View prices in  or ...    
ALL CATEGORIES   Semiconductor Mfg Eq   Chemical Vapor Dep    View    Search-by-Specs    Input    Edit    

FULL DESCRIPTION of Item 191492

in Other Chemical Vapor Deposition Equipment
Deal directly with Owner:  GLOBALFOUNDRIES USED EQUIPMENT of Santa Clara, CA
 
Item ID: 191492

Offered1 Offered at Best Price


Picosun, Sunale R-200, Advanced ALD Reactor, 300mm

Picosun, Sunale R-200, Advanced ALD Reactor, 300mm

Configured with three canisters and chemicals to deposit Ni, HfO, Ru and SiO, Al

SUNALETM R-200 Advanced ALD System
The ALD reactor has six separate inlets for precursor sources. It can accommodate up to twelve precursor sources. Maximum deposition temperature of the ALD reactor is 500 °C.

 Vacuum chamber (AISI304)

AISI 304 stainless steel vessel with KF/CF connection flanges for RC-200 reaction chamber.

Reaction Chamber (AISI316L)
RC-200 Chamber and lid with metal sealing surface. Customer specified chamber size up to 8”single Si wafer or smaller wafers (4”, 6”) and pieces

Sample holder SH-200
Substrate holder for one up to 8” wafer or smaller wafers (4”, 6”) and pieces compatible with reaction chamber

Advanced source control and electronics system
Touch panel PC and electronics cabinet used for operating the ALD reactor with Advanced 12-source ALD software and electronics

PicosolutionTM 600 source system

Cooled source systems for high vapor pressure liquid precursors (e.g. for TMA, TiCl4 and H2O). Maximum capacity 600mL. 3ea.

Boosted PicohotTM 200 source system

Heated source systems (up to 200 °C) for low vapor pressure metal precursors (e.g. for TEMAHf, TEMAZr). Suitable also for high vapor pressure chemicals.  2ea.

PicohotTM 300 source system

Heated source system (up to 300 °C) for low vapor pressure metal precursors (e.g. for HfCl4, ZrCl4).  1ea.

PicogasesTM Connection

Allows for the connection of an additional externally supplied compressed gas for use as an ALD precursor (e.g. NH3, O2). Includes plumbing, valves, and control of extra gas source.

DOM:6/18/2013

Tool ID: W231-14N0082DA

Picosun, Sunale R-200, Advanced ALD Reactor, 300mm
  Click to see additional image(s)... other image

Location: East Fishkill, New York
Unit Price Unstated
Number of Units 1
Manufacturer Picosun
Model Sunale R-200
Description Advanced ALD Reactor
Year of Manufacture 2013

OFFERED BY: (click name below to visit its website directly)

GLOBALFOUNDRIES USED EQUIPMENT
Finance
Santa Clara , CA
+1.408.462.4875
 
Shipping & Handling:

All freight cost estimates are for dock to dock service only.
Any additional services, i.e. lift-gate, inside or residential delivery, must be requested at the time of sale and will be billed accordingly.
GLOBALFOUNDRIES is not responsible for any damage incurred during shipment. It is the buyer's responsibility to inspect packages for damage and to note any damage on bill of lading.
 
Payment:

All other sales, including foreign sales, are prepayment only.
MasterCard, VISA, Discover and AMEX are accepted at sellers discretion.

 


Deal directly with Owner:  GLOBALFOUNDRIES USED EQUIPMENT of Santa Clara, CA