• The complete tested, refurbished 2.5kw microwave generator set includes:
  • 19-inch rack-mounted switching power supply equipped with both local (front panel) and remote (computer) control functionality.
  • Water-cooled 2.5kW magnetron head with variable output.
  • Water-cooled 3-way circulator.
  • All interconnecting cables for the above components.
• Operational and ready to ship with relatively short lead-time. 
• Limited warranty can be considered depending on the application.

• Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production.
• System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components.
• Alternatively, a kit of core components can be offered for skilled users interested in building their own system.
• This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
• 1.5kW to 5kW microwave power input.
• 3 stage options: Cooled, Heated, or Thermally Floating.
• Integration with computer controls is strongly recommended.
• Chamber designs vary by vintage, but can be confirmed at the time of quotation.
• Please note that the chamber shown in the attached image is a new chamber.  The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design.

High density plasma system activated by ECR-enhanced, 2.45GHz microwave input offers PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures.

Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching.

This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.

• For use with compatible Astex switching microwave power supplies.

Magnetron Head

This furnace can handle wafers up to 150mm

Configuration:

N2 -  1500 l/min

N2 -    660 l/min

Forming Gas 660l/min

Temperature Control 0°C – up to 500°C max.

Free Ramping (up to 99 steps max., one step up to 99,99 °C max.)

Stainless Steel Calotte 0 – 5kg

Exhaust Filter

Two Stage Mechanical Vacuum Pump

Pumping speed and ultimate pressure are based on 60 Hz operation.

RF Power Supply

Turbo Pump Controller

for DRAG 020 • TPH/U 035 • TMH/U 064/065

Pump Controller

Turbo Pump with TCP 5000 Controller

Turbo Pump

Will be rebuild once sold

Rebuilt Turbo Pump

Compatible turbo pump controller Model TCP 120 not inlcuded, but available for sale. 
See our item 4481: Balzers TCP 120 Turbo Pump Controller

Pump to be rebuilt at the time of sale, inquire on lead-time.

Turbo Pump

Bellows ISO K 100 X 145mm

Mass Flow Read Out and Control

Mass Flow Controller

Mass Flow Controller

Liquid Mass Flow Controller

Mass Flow Controller
Thermal Mass Flow 
New--Unused

Mass Flow Controller
Thermal Mass Flow 

Direct Current Power Supply

Dry Rotary Vane Vacuum Pump

Silicon Carbide 200 mm Disc Susceptor

Carbone of America Part number 017893-001

Filament Evaporator--Cryo Pumped

Radio Frequency Generator

DC High Power Amplifier

Multi-Range DC Sputtering Power Supply

Novellus P/N: G1900219000

Cryocooler Refrigeration System

Controller for use with On-Board High Vacuum Pumps
Part Number: 8052300G001

CTI Cryogenics 8011

Temperature Indicator

Temperature Indicator

P/N: 8032550G002

P/N: 8032550G002

Cryogenic Compressor

Compressor paired with 8004 controller for a single OnBoard pump
Or...
Compressor paired with 8001 controller for a single CryoTorr pump

Used Cryopump with ANSI Flange and Diode

P/N: 8018182G001

Pump to be rebuilt once sold, inquire on lead-time.